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It is not possible to discuss the obstacles in detail within the space available for this article. The architecture and method overcome all obstacles that have hitherto prevented high-yield, low-cost fabrication of back-illuminated CMOS/CCD imagers by use of standard VLSI fabrication tools and techniques. The architecture and method are compatible with next-generation CMOS dielectric-forming and metallization techniques, and the process flow of the method is compatible with process flows typical of the manufacture of very-large-scale integrated (VLSI) circuits.
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The architecture and method are expected to enable realization of the full potential of back-illuminated CMOS/CCD imagers to perform with high efficiency, high sensitivity, excellent angular response, and in-pixel signal processing.
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This overcomes the present challenge in spatially overlapping a terahertz/mid-IR pump and x-ray probe radiation at facilities such as free electron lasers, synchrotron, and laser-based x-ray sources.ĭesign and Fabrication of High-Efficiency CMOS/CCD ImagersĪn architecture for back-illuminated complementary metal oxide/semiconductor ( CMOS) and charge-coupled-device ( CCD) ultraviolet/visible/near infrared- light image sensors, and a method of fabrication to implement the architecture, are undergoing development. Furthermore, with the silicon CCD/CMOS technology being sensitive to mid-infrared (mid-IR) and the x-ray ranges, we introduce silicon as a single detector platform from 1Â EHz to 2Â THz. Our findings allow us to extend the low-frequency terahertz cutoff to less than 2Â THz, nearly closing the technological gap with electronic imagers operating up to 1Â THz.
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Here we show that silicon, complementary metal-oxide-semiconductor ( CMOS) technology offers enhanced detection sensitivity of almost two orders of magnitude, compared to CCDs. Recently, it has been shown that silicon CCDs can detect terahertz photons at a high field, but the detection sensitivity is limited. However, the small quantum photon energies of terahertz radiation have hindered the use of this mature semiconductor technological platform in this frequency range, leaving terahertz imaging totally dependent on low-resolution bolometer technologies. Shalaby, Mostafa Vicario, Carlo Hauri, Christoph PĬharge-coupled devices (CCDs) are a well-established imaging technology in the visible and x-ray frequency ranges. Single-silicon CCD-CMOS platform for multi-spectral detection from terahertz to x-rays. New data and discussions presented in this paper include: 1) a new buried channel CCD fabricated on a CMOS process line, 2) new data products generated by high performance custom scientific CMOS 4T/5T/6T PPD pixel imagers, 3) ultimate CTE and speed limits for large pixel CMOS imagers, 4) fabrication and test results of a flight 4k x 4k CMOS imager for NRL's SoloHi Solar Orbiter Mission, 5) a progress report on ultra large stitched Mk x Nk CMOS imager, 6) data generated by on-chip sub-electron CDS signal chain circuitry used in our imagers, 7) CMOS and CMOSCCD proton and electron radiation damage data for dose levels up to 10 Mrd, 8) discussions and data for a new class of PMOS pixel CMOS imagers and 9) future CMOS development work planned. Previous papers delivered over the last decade have documented developmental progress made on large pixel scientific CMOS imagers that match or surpass CCD performance.
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Elliott, Tom Andrews, James Tower, John Pinter, Jeff Fundamental performance differences of CMOS and CCD imagers: part V